No Access Submitted: 09 April 2010 Accepted: 04 June 2010 Published Online: 25 June 2010
Appl. Phys. Lett. 96, 251110 (2010); https://doi.org/10.1063/1.3457921
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  • R. C. Word
  • T. Dornan
  • R. Könenkamp
We use photoemission microscopy to characterize localized surface plasmon distributions in nanostructured gold layers on indium-tin-oxide/glass substrates. The Au films have a fractal dimension of 1.3 and smallest feature sizes of 100nm. We use femtosecond laser pulses at a wavelength of 800nm for the plasmon excitation. Photoelectron emission occurs by a three-photon process in localized areas of indium-tin-oxide with 70nm diameter. In these areas the photoemission rate is enhanced several thousand fold compared to nonstructured surface areas. The results show that plasmon enhanced photoemission can be induced in a nonabsorbing material in proximity to a plasmon-active metal nanostructure.
This work was supported by the Department of Energy Basic Science office under Grant No. DE-FG02-07ER46406. T. Dornan acknowledges support from the Oregon Nano and Microtechnologies Institute, ONAMI.
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