MENU
  • Scitation Home
SUBMIT YOUR ARTICLE

Thank you

For your interest in Journal of Applied Physics

Check for updates on crossmark
Prev Next
No Access Submitted: 13 June 2008 Accepted: 04 October 2008 Published Online: 20 November 2008

  • Decomposition of methylene blue in water using a dielectric barrier discharge: Optimization of the operating parameters

Journal of Applied Physics 104, 103306 (2008); https://doi.org/10.1063/1.3021452
Monica Magureanu1, a), Daniela Piroi1, Nicolae Bogdan Mandache1, and Vasile Parvulescu2
more...View Affiliations
View Contributors
  • Monica Magureanu
  • Daniela Piroi
  • Nicolae Bogdan Mandache
  • Vasile Parvulescu
ABSTRACT
The decomposition of methylene blue (MB) in aqueous solution was investigated using a dielectric barrier discharge in coaxial configuration operated in pulsed regime. The MB solution (volume=300 ml, concentration=50 mg/l) contained in a reservoir was circulated by a pump and made to flow as a film over the surface of the inner electrode of the plasma reactor. The best results were obtained when the discharge was operated in oxygen. The conversion of MB reached 95% after 30 min of plasma treatment and the corresponding yield was 57 g/kW h. Increasing the amplitude of the voltage pulses, and implicitly, the power dissipated in the discharge led to faster decomposition of the dye; however, the yield for MB degradation was lower. Better results were obtained for negative polarity of the applied voltage as compared to positive polarity, but after 30 min treatment the conversion had similar values for both cases. The gas flow rate did not influence the decomposition of MB in the range investigated, 300–900 ml/min. The solution flow rate had an effect on the dye degradation only for short treatment times, where a lower flow rate led to improved results, while for long treatment times the conversion was similar for 30 and 90 ml/min.

ACKNOWLEDGMENTS

The authors gratefully acknowledge financial support from the Romanian Ministry for Education and Research under the IDEI Programme (Project No. ID-223, Contract No. 34/2007) and from the Swiss National Science Foundation under the SCOPES Programme (Project No. 510879)

REFERENCES
Section:
Previous sectionNext section

  1. 1. I. K. Konstantinou and T. A. Albanis, Appl. Catal., B https://doi.org/10.1016/j.apcatb.2003.11.010 49, 1 (2004). Google ScholarCrossref
  2. 2. B. Sun, M. Sato, and J. S. Clements, J. Electrost. https://doi.org/10.1016/S0304-3886(97)00002-8 39, 189 (1997). Google ScholarCrossref
  3. 3. B. Sun, S. Kunitomo, and C. Igarashi, J. Phys. D https://doi.org/10.1088/0022-3727/39/17/016 39, 3814 (2006). Google ScholarCrossref
  4. 4. A. A. Joshi, B. R. Locke, P. Arce, and W. C. Finney, J. Hazard. Mater. https://doi.org/10.1016/0304-3894(94)00099-3 41, 3 (1995). Google ScholarCrossref
  5. 5. M. A. Malik, U. Rehman, A. Ghaffar, and K. Ahmed, Plasma Sources Sci. Technol. https://doi.org/10.1088/0963-0252/11/3/302 11, 236 (2002). Google ScholarCrossref
  6. 6. P. Sunka, V. Babicky, M. Clupek, M. Fuciman, P. Lukes, M. Simek, J. Benes, B. Locke, and Z. Majcherova, Acta Phys. Slov. 54, 135 (2004). Google Scholar
  7. 7. A. T. Sugiarto, S. Ito, T. Ohshima, M. Sato, and J. D. Skalny, J. Electrost. https://doi.org/10.1016/S0304-3886(02)00203-6 58, 135 (2003). Google ScholarCrossref
  8. 8. W. F. L. M. Hoeben, E. M. van Veldhuizen, W. R. Rutgers, C. A. M. G. Cramers, and G. M. W. Kroesen, Plasma Sources Sci. Technol. https://doi.org/10.1088/0963-0252/9/3/315 9, 361 (2000). Google ScholarCrossref
  9. 9. R. Burlica, M. J. Kirkpatrick, W. C. Finney, R. J. Clark, and B. R. Locke, J. Electrost. 62, 309 (2004). Google ScholarCrossref
  10. 10. M. M. Kuraica, B. M. Obradovic, D. Manojlovic, D. R. Ostojic, and J. Puric, Vacuum 73, 705 (2004). Google ScholarCrossref
  11. 11. J. Y. Park, P. V. Kostyuk, S. B. Han, J. S. Kim, C. N. Vu, and H. W. Lee, J. Phys. D https://doi.org/10.1088/0022-3727/39/17/015 39, 3805 (2006). Google ScholarCrossref
  12. 12. A. G. Bubnov, E. Yu. Burova, V. I. Grinevich, V. V. Rybkin, J. -K. Kim, and H. -S. Choi, Plasma Chem. Plasma Process. 26, 19 (2006). Google ScholarCrossref
  13. 13. L. R. Grabowski, E. M. van Veldhuizen, A. J. M. Pemen, and W. R. Rutgers, Plasma Sources Sci. Technol. 16, 226 (2007). Google ScholarCrossref
  14. 14. D. Hayashi, W. F. L. M. Hoeben, G. Dooms, E. M. van Veldhuizen, W. R. Rutgers, and G. M. W. Kroesen, J. Phys. D https://doi.org/10.1088/0022-3727/33/21/315 33, 2769 (2000). Google ScholarCrossref
  15. 15. L. R. Grabowski, E. M. van Veldhuizen, A. J. M. Pemen, and W. R. Rutgers, Plasma Chem. Plasma Process. https://doi.org/10.1007/s11090-005-8721-8 26, 3 (2006). Google ScholarCrossref
  16. 16. P. Lukes, M. Clupek, V. Babicky, V. Janda, and P. Sunka, J. Phys. D https://doi.org/10.1088/0022-3727/38/3/010 38, 409 (2005). Google ScholarCrossref
  17. 17. X. Hao, M. Zhou, Q. Xin, and L. Le, Chemosphere https://doi.org/10.1016/j.chemosphere.2006.08.037 66, 2185 (2007). Google ScholarCrossref
  18. 18. J. Zhang, Z. Zheng, Y. Zhang, J. Feng, and J. Li, J. Hazard. Mater. 154, 506 (2008). Google ScholarCrossref
  19. 19. Y. -J. Liu, X. -Z. Jiang, and L. Wang, Plasma Chem. Plasma Process. 27, 496 (2007). Google ScholarCrossref
  20. 20. Y. Liu and X. Jiang, Plasma Chem. Plasma Process. https://doi.org/10.1007/s11090-007-9110-2 28, 15 (2008). Google ScholarCrossref
  21. 21. L. Wang, X. Jiang, and Y. Liu, Plasma Chem. Plasma Process. 27, 504 (2007). Google ScholarCrossref
  22. 22. M. A. Malik, Plasma Sources Sci. Technol. 12, S26 (2003). Google ScholarCrossref
  23. 23. M. Magureanu, N. B. Mandache, and V. I. Parvulescu, Plasma Chem. Plasma Process. https://doi.org/10.1007/s11090-007-9087-x 27, 589 (2007). Google ScholarCrossref
  24. 24. Y. S. Mok, H. T. Ahn, and J. T. Kim, Plasma Sources Sci. Technol. 9, 71 (2007). Google ScholarCrossref
  25. 25. J. Xue, L. Chen, and H. Wang, Chem. Eng. J. 138, 120 (2008). Google ScholarCrossref
  26. 26. M. R. Ghezzar, F. Abdelmalek, M. Belhadj, N. Benderdouche, and A. Addou, Appl. Catal., B https://doi.org/10.1016/j.apcatb.2006.11.008 72, 304 (2007). Google ScholarCrossref
  27. 27. Z. Ruo-bing, W. Yan, and L. Guofeng, Plasma Sources Sci. Technol. https://doi.org/10.1088/0963-0252/14/2/012 14, 308 (2005). Google ScholarCrossref
  28. 28. F. Abdelmalek, S. Gharbi, B. Benstaali, A. Addou, and J. L. Brisset, Water Res. 38, 2339 (2004). Google ScholarCrossref
  29. 29. Ch. M. Du, J. H. Yan, and B. G. Cheron, Plasma Chem. Plasma Process. https://doi.org/10.1007/s11090-007-9092-0 27, 635 (2007). Google ScholarCrossref
  30. 30. J. Gao, X. Wang, Z. Hu, H. Deng, J. Hou, X. Lu, and J. Kang, Water Res. 37, 267 (2003). Google ScholarCrossref
  31. 31. J. Gong and W. Cai, Plasma Sources Sci. Technol. 9, 190 (2007). Google ScholarCrossref
  32. 32. G. Ke and D. Yanjie, Plasma Sources Sci. Technol. https://doi.org/10.1088/0963-0252/14/3/023 14, 589 (2005). Google ScholarCrossref
  33. 33. S. Tomizawa and M. Tezuka, Plasma Chem. Plasma Process. 27, 486 (2007). Google ScholarCrossref
  34. 34. P. Lukes, A. T. Appleton, and B. R. Locke, IEEE Trans. Ind. Appl. https://doi.org/10.1109/TIA.2003.821799 40, 60 (2004). Google ScholarCrossref
  35. 35. F. Holzer and B. R. Locke, Plasma Chem. Plasma Process. https://doi.org/10.1007/s11090-007-9107-x 28, 1 (2007). Google ScholarCrossref
  36. 36. S. Mededovic and B. R. Locke, J. Phys. D https://doi.org/10.1088/0022-3727/40/24/021 40, 7734 (2007). Google ScholarCrossref
  1. © 2008 American Institute of Physics.

Article Metrics

Views
467
Citations
Crossref 70
Web of Science
ISI 61

Altmetric

Please Note: The number of views represents the full text views from December 2016 to date. Article views prior to December 2016 are not included.