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No Access Submitted: 30 July 2008 Accepted: 29 August 2008 Published Online: 23 September 2008

  • Fabrication of fully epitaxial magnetic tunnel junctions using L21-ordered Co2FeAl0.5Si0.5 electrodes and their tunneling magnetoresistance characteristics

Appl. Phys. Lett. 93, 122506 (2008); https://doi.org/10.1063/1.2988649
Wenhong Wanga), Hiroaki Sukegawa, Rong Shan, and Koichiro Inomata
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  • Wenhong Wang
  • Hiroaki Sukegawa
  • Rong Shan
  • Koichiro Inomata
ABSTRACT
Magnetic tunnel junctions (MTJs) using L21-ordered full-Heusler Co2FeAl0.5Si0.5 (CFAS) electrodes and an MgO tunnel barrier were prepared on MgO-buffered MgO (001) substrates by sputtering method. In situ and ex situ structural characterization confirms that the stacking structure of CFAS/MgO/CFAS is fully epitaxial, with smooth interfaces throughout. The microfabricated MTJs exhibited relatively high tunnel magnetoresistance ratios of 150% at room temperature and 312% at 7K. We observed a symmetrical crossover point from the bias voltage dependence of differential conductance between parallel and antiparallel magnetization configurations, and also a flat behavior in the parallel conductance, which can be explained by considering the characteristic half-metallic band structure of L21-ordered CFAS near the Fermi level.
This work was partly supported by the NEDO and CREST.

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