No Access Submitted: 21 January 1991 Accepted: 05 April 1991 Published Online: 04 June 1998
Appl. Phys. Lett. 59, 102 (1991); https://doi.org/10.1063/1.105558
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  • J. C. Wu
  • M. N. Wybourne
  • W. Yindeepol
  • A. Weisshaar
  • S. M. Goodnick
Narrow channel devices were fabricated using a split‐gate high electron mobility transistor structure in which electrons are forced through a double‐bend discontinuity. The low‐temperature conductance shows a number of peaks in the lowest quantized conductance plateau which correspond qualitatively to resonance effects that are predicted for the geometrical discontinuities of the double bend.
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